Tools Hardness PVD Coating Machine manufacturers What are Common PVD Coating Target Materials? The coating material that is going to be sputtered or vaporized is known as a 鈥渢arget鈥?or 鈥渟ource material鈥? There are hundreds of materials commonly used in PVD. Depending on what the end product is, materials range from metals, alloys, ceramics, compositions and just about anything from the periodic table. Some processes require unique coatings like carbides, nitrides, silicides and borides for specialized applications. Each have special qualities tailored to specific performance requirements. Graphite and titanium for example are often used in high performance aerospace and automotive components where friction and temperature are crucial success factors. To achieve a uniform thin film coating thicknesses that are often a few atoms or molecules thick, parts to be coated are often rotated on several axis at a uniform speed, or placed on conveyor belts moving past the deposition material鈥檚 plasma stream. Single or multi-layered coatings can be applied during the same deposition cycle. There are some recent international trends worth noting. One is that the non-equilibrium magnetron sputtering method has developed rapidly in large-scale coating equipment companies, especially European companies, and has begun large-scale industrial applications; the other is some companies in the United States. Magnetron sputtering has made great progress. The deposition rate of its plated oxide and nitride films almost reaches the metal rate. The vacuum furnace intermediate frequency magnetron sputtering has high requirements on the design of the target and the magnetic field and the working air pressure. The intermediate frequency magnetron sputtering is 2 to 3 times the deposition rate of the DC magnetron sputtering. Intermediate frequency magnetron sputtering works with two targets to prepare compound films. Due to its low ionization rate, it is difficult to find an optimal poisoning point, and the flow control of working gas is very strict. If the control is not good, it is difficult to prepare a uniform and good bonding film layer. Then, the design of the magnetic field is mainly about the uniformity of the magnetic field distribution, which can not only improve the utilization rate of the target material, but also greatly improve the stability of the optimal poisoning point when working. The ion energy and diffraction properties of magnetron sputtering are far Below the multi-arc target surface, the distance from the workpiece is very important. If the ions are too close to the workpiece, the bombardment of the workpiece can damage the film layer. If it is too far away, it will deviate from the optimal sputtering distance. The film has poor adhesion. The intermediate frequency target uses three pairs of targets, and some use three pairs. The targets are relatively large. As far as the intermediate frequency is concerned, most of them are metal-plated workpieces. Such vacuum furnaces are generally made relatively large. , You can put down a lot of task pieces, and the plated film is more dense. Application Parameter Our companyTools Hardness PVD Coating Machine manufacturers website:http://www.lk-bts.com/tools-hardness-pvd-coating-machine/